Stellenangebot
Take ownership of advanced patterning processes such as Optical Proximity Correction (OPC), lithography simulation, and proximity effect correction (PEC) for electron beam lithography (EBL), including
Stellenangebot
Take ownership of advanced patterning processes such as Optical Proximity Correction (OPC), lithography simulation, and proximity effect correction (PEC) for electron beam lithography (EBL), including